SAWATEC AG was formed in 1996. It was created by merging the two companies Sawatzki Engineering by Harry Sawatzki and Bruno Sawatzki Konstruktion. The two founders of the company merged their long-standing know-how in order to realise their semiconductor products through SAWATEC AG and put them on the market. SAWATEC AG is a high-tech company with high flexibility and great innovative power, a well-thought-out range of products with high-quality products at an attractive cost/performance ratio and with a profound network of traders and supporters all over the world. Product index: The Hotplates HP-150 The SAWATEC HP-150 hotplate has been developed for standard soft bake and hard bake processes in lithography and similar applications. The temperature range is designed as standard up to 250° C. The HP-150 offers high uniformity and process repeatability and can be used for substrates up to 150mm. Outstanding features of the hotplate are its robust design and ease of operation. The hotplate’s modular design means that it can be used in a wide range of applications with optional expandability (wet bench integration). More information about HP-150 
HP-200 The SAWATEC HP-200 hotplate has been developed for standard soft bake and hard bake processes in lithography and similar applications. The temperature range is designed as standard up to 250° C. The HP-200 offers high uniformity and process repeatability and can be used for substrates up to 200mm. Outstanding features of the hotplate are its robust design and ease of operation. The hotplate’s modular design means that it can be used in a wide range of applications with high optional expandability (wet bench integration). More information about HP-200 
HP-401 The SAWATEC HP-401 hotplate has been developed for standard soft bake and hard bake processes in lithography and similar applications. The temperature range is designed as standard up to 250° C. The HP-401 offers high uniformity and process repeatability and can be used for substrates up to 300mm. The hotplate comes as standard with proximity pins and loading pins, allowing simultaneous processing of five substrates (up to 100mm). Outstanding features of the hotplate are its robust design and ease of operation. The hotplate’s modular design means that it can be used in a wide range of applications with high optional expandability (wet bench integration). More information about HP-401 
HP-200-Z-HMDS The SAWATEC HP-200-Z-HMDS hotplate has been developed for standard soft bake and hard bake processes in lithography and similar applications. The multi-zone heating system (9 zones) ensures very high temperature distribution, which is adjustable for each zone. The hotplate also has a vacuum chamber and can be used as standard for bonding agent applications. The temperature range is designed as standard up to 300° C. The HP-200-Z-HMDS offers very high uniformity and process repeatability and can be used for substrates up to 200mm. Outstanding features of the hotplate are its robust design and ease of operation. The hotplate’s modular design means that it can be used in a wide range of applications with high optional expandability (wet bench integration). More information about HP-200-Z-HMDS;More information about P-200-Z-HMDS-Cabinetmodel 
HP-401-Z The SAWATEC HP-401-Z hotplate has been developed for standard soft bake and hard bake processes in lithography and similar applications. The multi-zone heating system (16 zones) ensures very high temperature distribution, which is adjustable for each zone. The temperature range is designed as standard up to 300° C. The HP-401-Z offers very high uniformity and process repeatability and can be used for substrates up to 300mm. The hotplate comes as standard with proximity pins and loading pins, allowing simultaneous processing of five substrates (up to 100mm). Outstanding features of the hotplate are its robust design and ease of operation. The hotplate’s modular design means that it can be used in a wide range of applications with high optional expandability (wet bench integration). More information about HP-401-Z;More information about HP-401-Z-Cabinetmodel 
Spin Modules Module SM-180 The instruments of the SAWATEC-Spin Module-line are easy to operate and to handle. The instruments of this line are available as Bench-Top or Bench-Mounted-version. They are designed to dry or coat wafers up to 6” or substrates up to 5” x 5” (127 x 127mm). The process-chamber works up to Ø 176mm. The Spin Module of SAWATEC AG will convince you of high uniformity and repeatability combined with easy handling. For pilot projects, institutes and R&D. More information about SM-180-BT ; More information about SM-180-BM 
Spin Coater LSM-250 The instruments of the SAWATEC-Spin Module-line are easy to operate and to handle. The instruments of this line are available as Cabinet or Bench-Mounted-version. They are designed to dry or coat wafers up to 8” or substrates up to 6” x 6” (150 x 150mm). The process-chamber works up to Ø 215mm. The Spin Module of SAWATEC AG will convince you of high uniformity and repeatability combined with easy handling. For pilot projects, institutes and R&D. More information about LSM-250, More information about LSM-250-BM 
Spin Coater LSM-300 The instruments of the SAWATEC-Spin Module-line are easy to operate and to handle. The instruments of this line are available as Cabinet or Bench-Mounted-version. They are designed to dry or coat wafers up to 12” or substrates up to 8” x 8” (200 x 200 mm). The process-chamber works up to Ø 300mm. The Spin Module of SAWATEC AG will convince you of high uniformity and repeatability combined with easy handling. For pilot projects, institutes and R&D. More information about LSM-300, More information about LSM-300-BM 
Dry Spin Modules Dry Spin Module TSM-180 The instruments of the SAWATEC-Spin Module-line are easy to operate and to handle. The instruments of this line are available as Bench-Top or Bench-Mounted-version. They are designed to dry or coat wafers up to 6” or substrates up to 5” x 5” (127 x 127mm). The process-chamber works up to Ø 176mm. The Spin Module of SAWATEC AG will convince you of high uniformity and repeatability combined with easy handling. For pilot projects, institutes and R&D. More information about TSM-180-BT, More information about TSM-180-BM 
Developer LRD-250 The instruments of the SAWATEC-LRD-line are easy to operate and to handle. The instruments of this line are available as Cabinet or Bench-Mounted-version. They are designed to clean, to develop and to etch wafers up to 8” or substrates up to 6” x 6” (150 x 150mm). The process-chamber works up to Ø 212mm. The Developer-Modules of SAWATEC AG will convince you of process performance and repeatability combined with easy handling. For pilot projects, institutes and R&D. More information about LRD-250, More Information about LRD-250-BM 
Cluster Systems SAWATEC-Cluster-System-4 The SCS-4 is a fully programmable cassette-to cassette system. It can be equipped with the modules as coater, cleaner, developper, HMDS-hotplates, hotplates and coolplates for wafer sizes up to 8’’ and substrates up to 6’’ x 6’’. The SCS-4 is equipped with a central positioned 3-axis field approved high speed robot. By interest please directly contact us. 
Wet Bench Wet Bench WBS-Line The Wet Bench-system of SAWATEC AG is designed for cleanrooms. Based upon the standard-version, practically all individual customer needs are satisfied by the Wet Bench-system thanks to its high flexibility and to its modularity. The advantages of the SAWATEC-Wetbench are: - Simple retrofit
- Newest technology
By interest please directly contact us. 
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