  MicroChem Corp. (MCC) develops, manufactures, sells, and supports specialty niche chemicals for semiconductor/IC, thin film head, and other electronic manufacturing applications. The primary focus is photosensitive materials, such as photoresists, and other ancillary products. MCC technology consists of proprietary and non-proprietary products requiring state-of-the-art technical expertise, high reproducibility, high product cleanliness, and specialty microfiltration. MicroChem manufactures all of their products in their newly re-fitted 25,000 square foot facility in Newton, Massachusetts. All the products are made in environmentally controlled areas and packaged in Class 100 Cleanroom environments. Microchem resist products are available in 500ml, 1 Liter, 4 Liter Amber glass bottles, in addition we can package into 10 and 20 Liter Nowpaks. The ancillary products are available in 4 Liter Polyethylene bottles, Nowpaks and 55 Gallon drums. Product index: Application Note (pdf) l PMGI and LOR Resists l SU-8 2000 and 3000 series Resists l KMPR 1000 Photoresist l PMMA Resist l Ancillaries l MicroSpray PMGI and LOR Resists PMGI and LOR resists coatings are uniquely suited for use as a sacrificial layer and as the under-layer in bi-layer lift-off metallization processing.   
Material Attributes l Dissolution in aqueous based developers and submicron line width control. l Compatible with most g-line, i-line, and DUV photoresists -Resistant to conventional semiconductor solvents. l Excellent adhesion to Si, NiFe, Cu, Au, GaAs, and other III-V/ III-VI materials. l High thermal stability < 300℃. (Tg ~189℃) l DUV, E-beam, and x-ray sensitivity. l Optically transparent. l Spin-coatable from 10nm to ~6 um in a single coat. l Strippable in NMP and DMSO-based removers. l High etch rate in oxygen plasma. PMGI & LOR Data sheet: PMGI & LOR Resist Data Sheet (pdf) LOR/PMGI Product Selection Guide: Selection Guide SU-8 2000 and 3000 Series Resists The SU-8 product line consists of chemically amplified; epoxy based negative resists with high functionality, high optical transparency and are sensitive to near UV radiation. Cured films or topography are highly resistant to solvents, acids and bases and have excellent thermal stability, making it well suited for permanent use applications.   
Microfluidics Ultra Thick high aspect ratio Encapsultion/Passivation Material Attributes SU-8 2000 l >10:1 aspect ratio imaging with vertical sidewalls. l 200 um in a single spin coat. l High chemical and plasma resistance. l Faster Drying Films. SU-8 3000 l 5:1 aspect ratio imaging with vertical sidewalls. l Up to 100 um in a single spin coat. l High chemical and plasma resistance. l Enhanced adhesion. (Shear analysis pdf) SU-8 Data sheet (pdfs): > 2000.5 - 2015 > 2025 - 2075 > 2100 - 2150 > 3000 SU-8 Properties KMPR 1000 Photoresist A high aspect ratio thick plating resist for IC packaging and MEMS. KMPR® 1000 is a high contrast, i-line sensitive epoxy-based photoresist that can be developed in conventional aqueous alkaline-based developers and readily removed from the substrate.    Material Attributes l High aspect ratio imaging with vertical sidewalls. l Up to 100 um in a single spin coat. l Compatible with standard aqueous alkaline-based developers. l No cracking. l Strippable with wet or dry chemistry. l High chemical and plasma resistance l Excellent adhesion to metals l Excellent electrolytic plating bath stability. KMPR 1000 Data sheet: KMPR Data sheet (pdf) PMMA Resist PMMA positive resists are based on special grades of polymethyl methacrylate designed to provide high contrast, high resolution for e-beam, deep UV (220-250nm) and X-ray lithographic processes. In addition, PMMA is often used as a protective layer in III-V device wafer thinning applications. Standard products include 495,000 and 950,000 molecular weights (MW) in a wide range of film thicknesses formulated in chlorobenzene, or the safer solvent anisole. In addition 50,000, 100,000, 200,000 and 2.2 million MW are available upon request. Copolymer resists are based on a mixture of PMMA and ~8.5% methacrylic acid. Copolymer MMA (8.5) MAA is commonly used in combination with PMMA in bi-layer lift-off resist processes where independent control of CD size and shape of each resist layer is required. Standard copolymer resists are formulated in the safer solvent ethyl lactate and are available in a wide range of film thicknesses. In addition, MMA (17.5) MAA copolymer resists are available upon request.  T-gate resulting from PMMA/Copolymer bilayer resist stack.
Product Attributes l Sub 0.1µm imaging l E-beam, Deep UV and X-ray imagable l Broad range of molecular weights & dilutions l Compatible with multi-layer processes l Excellent adhesion to most substrates Applications for PMMA & copolymer resists l Multi-layer T-gate processes l Other direct write e-beam processes l Protective layer for III-V device wafer thinning PMMA & Copolymer Resists: PMMA Resist Data Sheet Ancillaries MicroChem offers a broad line of ancillary products for resist thinning, edge bead removal, development, rinse and removal of photoresists. These products work effectively with our PMGI, LOR, PMMA & copolymer and SU-8 resists as well as with many other commercially available photoresist products. Competitively priced, these ancillary products and are available in a wide range of package sizes. Adhesion Promoter/Release Layer: l OmniCoat Photoresist thinners l SU-8 2000 thinner (to dilute SU-8 2000 resists) l T thinner (to dilute PMGI SF resists) l G thinner (to dilute PMGI and LOR SFG resists) l A thinner (to dilute PMMA A resists) l C thinner (to dilute PMMA C resists) l EL thinner (to dilute copolymer resists) Edge bead remover l EBR PG (pdf) (Edge bead removal, equipment cleandown) Developers l PMGI 101 developer (to selectively develop PMGI resists) l SU-8 developer (to develop SU-8 & SU-8 2000 resists) l MIBK:IPA 1:1 (pdf) (to develop PMMA & copolymer resists) l MIBK:IPA 1:2 (pdf) (to develop PMMA & copolymer resists) Rinse l MIBK:IPA 1:3 (pdf) to rinse PMMA & copolymer resists Removal l Remover PG (pdf) (to strip SU-8, PMGI, LOR & PMMA resists) |
Photonics & Solar PV