All SF-100 systems provide users with the ability to manipulate materials using light. The mercury arc lamp provides optical energy at g-line (435nm), h-line (405nm), and i-line (365nm) wavelengths, which are projected onto substrate materials in user designed patterns using the SF-100 XPRESS's patented technology.
The most common application of SF-100 systems is to transfer micro patterns onto a substrate. This pattern transfer technique is called Photolithography. Standard photolithography process steps are detailed below.
Step 1: Photoresist Coating – A substrate, an object onto which the image is transferred or projected, is coated with photoresist, a liquid polymeric material. The photoresist is the material that the image will be transferred to during the photolithography process. The coating process is typically performed by spinning the substrates at speeds between 1000 and 5000 rpm. Photoresist is deposited onto the substrate surface during this dynamic movement to ensure even coating over the entire substrate surface. Another alternative is to employ dry film photoresists which can be laminated into place to create the photopatternable surface.
A substrate coated with photoresist
Step 2: Exposure – Once the substrate has been coated with photoresist, the substrate is then exposed on an exposure tool. This is the process step that the SF-100 performs. In standard processes, the system shines light through a glass plate which is partially coated with chrome. This plate, termed a photomask or mask, has the master image of the device on it. By shining light through it and onto the substrate, individual areas of the photoresist are selectively exposed to light. This exposure causes a chemical change in the photoresist. The SF-100 is able to perform this process step without the need for a photomask, providing the user many financial and technical benefits over conventional technieques. After exposure, the photoresist that was exposed to light changes chemically on the substrate.
The photoresist coated substrate after exposure
Step 3: Development – Once exposed, the substrate is then immersed in a developer solution. Developer solutions are typically aqueous and will dissolve away areas of the photoresist that were exposed to light. Therefore, after successful development, the photoresist is patterned with the master image that was provided by the user.
After development, the resist pattern is observed on the substrate
Step 4: Hardbake – After development, the substrate is baked in an oven or hot plate at temperatures between 100-120C. This is needed to drive off liquids that may have been absorbed on the substrate and to crosslink the remaining photoresist. Crosslinking the polymer increases mechanical and chemical stability of the material, allowing it to be used in further substrate processing.
After hardbaking the patterned substrate is chemically stable and ready for future processing
The above process can be extended for use with many other photoactive materials, in addtion to photoresists. Polyimides, SU-8, photoimageable ceramics, and photoimageable metals have been used successfully on all SF-100 systems. The process flows for these materials is similar to that used for photoresists.
Additionally, many other photo sensitive materials can be altered on SF-100s. These materials include peptides, proteins, cells, and hydrogels. Due to the system's inherent flexibility, the system can be easily modified to accommodate any special handling required for the processing of these unique substances.
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How does the SF-100 work?
SF-100 systems are elegantly simple, easy to use micro patterning systems. Through their unique patented design, the system allows user to fabricate microdevices quickly and easily.
Smart Filter Technology provides the means for easy and efficient optical processing utilizing the SF-100. This technique utilizes reflective microoptoelectromechanical (MOEM) elements to spatially modulate light such that light can be controlled simultaneously over a field of view which provides over 750,000 individual pixels. Each SF-100 system includes a Smart Filter subassembly that incorporates all of the hardware and control software needed to produce these images in real time.
Figure 1 shows a schematic of a typical SF-100 system. Designs are drawn using conventional engineering design or drawing programs. These designs are then transferred to the SF-100 host computer for use on the system. The SF-100 computer is a standard personal computer that provides dual video output, one to the computer monitor and the other to the Smart Filter subassembly. The Smart Filter then modulates the appropriate MOEM elements which are used to produce the pattern.
Figure 1-A schematic representation of an SF-100 XPRESS Maskless Lithography System
A mercury arc lamp is the source of optical energy for the SF-100. Since g-line (435 nm), h-line (405 nm), and/or i-line (365 nm) energies are transmitted to the substrate surface, many standard optical materials are compatible with the SF-100. Light energy passes from the lamp to the Smart Filter subassembly through a variety of optical components needed to provide collimated and uniform energy over the entire exposure area. The light reflects off of the Smart Filter assembly to provide the optical pattern. After passing through additional optical components, the pattern is projected onto the substrate. Most SF-100 systems include an automated stage assembly to provide substrate motion. This allows the substrate to be moved in three dimensions, providing alignment in two, coplanar dimensions. An inline camera is used for feature registration and inspection of the exposed substrate pattern.
A UV filter is included in the light path to provide for image to substrate alignment. This sub-assembly provides for varying both the overall energy level and the individual wavelength(s) at the substrate surface. The optical components that allow for this variation can all be changed in less than 2 hours, allowing for customization of the exposure wavelength(s) and energy levels for each user.
Each SF-100 model is slightly different, to provide user specific solutions to our customers. Hence, some of the options discussed above may not be applicable to your specific SF-100 system. Check with your local IMP sales representative to learn more about which SF-100 system best suites your needs and how we can help you solve your most difficult technical problems.
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SF-100 System Options
In our business, each system we ship includes different customer specific requirements and capabilities. We offer this customization through a number of upgrades that are available for your SF-100 system. Some of the more common upgrades are listed below. Note that each upgrade may not be available on each SF-100 model, so check with your local sales representative to determine which options can help you solve your most difficult processing problems.
Rotational Substrate Stage
We've been patterning non-flat substrates since the inception of our company in 2001. Our rotational substrate stage provides a 5th axis of motion to our standard stage offerings, allowing the user to process cylindrical substrates. These substrates vary in sizes between 1mm diameter and larger than 14 inches, so we can provide the right handler you need for your application. Click Here to download the Rotational Substrate Stage brochure.
Microfluidics Research Option
Since one of the largest served markets for the SF-100 product line is microfluidics, we offer an upgraded stage assembly that supports microfludics research and development. Through this modified stage assembly, the research can both pattern and analyze microfludic devices on a single system. Additionally, our integrated camera assembly offers the user significant flexibility and capabilties for measuring the performance of microfluidic devices. Click Here to download information on this option.
Extended Warranties
Although the SF-100 is field proven to be reliable, some customers utilize extended warranties to guarantee their maintenance costs duriing the first years of system operation. As a result we offer extended warranties on all SF-100 systems at the time of system purchase.
Wafer Level Automation
For user's operating in production or pilot line operations, IMP offers fully automated systems through either cassette to cassette processing and even cluster tool configurations. Using industry proven robotics and software architecture, we can provide custom solutions to ensure high throughput and wafer output to these commercial customers.
Larger Stage Options
We offer a number of different types of stages for different substrate applications. Although standard configurations are quoted with all SF-100 systems, we can always modify these standard stages to support larger substrates. These increased sized units are needed for large area patterning in the areas of solar research and display development.
Additional Reduction Optics
Since we design our optics kits as modular subassemblies, you can always purchase additional reduction lenses to alter your exposure pixel size as your needs change. These standard products are typically available with short leadtimes, so you can easily and quickly modify your system to accommodate the latest technological innovations and developments in your area of expertise.
Please contact IMP directly or your local IMP sales professional to review any of the above options and get the most from your SF-100 investment.
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SF-100 XCEL
The Simplest and Easiest to Use Maskless Lithography System on the Market, the SF-100 XCEL
The new SF-100 XCEL has been developed for a wide range of lithography applications. IMP has taken the same UV optics that have been used on SF-100 systems since 2004 and packaged them in a simple, very reliable system that can provide for features as small as 15 microns in size. This can be further reduced using the optional 3X reduction lens to make features as small as 5 microns is size.
Since these processes use standard photoresists, polyimides, or SU8 materials, the SF-100 XCEL integrates easily into your existing photolithography line. The applications for this system are endless. Use the SF-100 XCEL to train students in basic processing, pattern a variety of features for non-critical applications, and even perform lithography on curved substrates. All of these capabilities are available to you at a low system price.
The SF-100 XCEL Provides Superior Features at a Low System Price
• Mercury arc lamp provides standard g-, h-, and i-line energies for compatibility with most commercial photoresists, polyimides, and SU8. Ensures low operational cost, typically less than $2000 per year.
• Small system footprint: 40” high x 20” deep x 16” wide. Easily fits on a benchtop.
• Field proven optical design integrated with patented Smart Filter Technology.
• Integrated CCD camera for in-line substrate viewing.
• Labwindows™ based software integrates all systems functions, while providing an open platform for software customization and integration with other systems.
• Labwindows™ based Vision Developers Module provides the basis for all camera functions on the system, ensuring reliability and versatility.
• OEM model is available to integrate optical patterning into other non-lithography systems.
• Rapid prototyping of new designs and ideas without the need for costly photomasks.
• IMP’s legendary customer service, engineering, and support services ensure your success.
• Optional X, Y, Z, and theta stages utilizes precise manual drives for stitching individual exposures and processing large area substrates.
• Choose additional optional features to customize your system. These include 3X reduction lens to provide 5 micron pixels, rotational stage for cylinder patterning, microfluidics research platform, and extended warranties.
Click here to download the SF-100 XCEL brochure.
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SF-100 XPRESS
Small Lines at a Great Price. Meet the SF-100 XPRESS
Since July, 2008, the SF-100 XTREME has been the industry’s leading maskless lithography solution for patterning lines as small as 1 micron in size, with previously unheard of flexibility and performance. However, since all user’s are not in a financial position to purchase this superior system, we have introduced the SF-100 XPRESS. This system is built on the same platform as the SF-100 XTREME, but offers the user the ability to customize their SF-100 XPRESS for their specific needs, purchasing only those features that are critical to their process. The result is the same exceptional performance at a lower cost. And, since both systems utilize the same platform, the SF-100 XPRESS can be fully upgraded in the field to an SF-100 XTREME.
The SF-100 XPRESS Offers Many Standard Features.
• Mercury arc lamp provides standard g-, h-, and i-line energies for compatibility with most commercial photoresists,
polyimides, and SU8. Ensures low operational cost, typically less than $2000 per year.
• 6 position filter wheel for choosing wavelength spectra specific to your process.
• Field proven optical design integrated with patented Smart Filter Technology.
• Integrated CCD camera for in-line substrate viewing, supporting standard optical functions, such as autofocussing.
• Fully automated XYZ stage provides 1 button operation and auto stitching for large substrates.
• Labwindows™ based software integrates all systems functions, while providing an open platform for software customization and integration with other systems.
• Labwindows™ based Vision Developers Module provides the basis for all camera functions on the system, ensuring reliability and ease of customization.
• Full field upgradability to the SF-100 XTREME maskless lithography system.
• Rapid prototyping of new designs and ideas without the need for costly photomasks.
• IMP’s legendary customer service, engineering, and support services ensure your success.
• Complete 1 year warranty, including customer training at system witness and at the customer site.
Click here to download the SF-100 XPRESS brochure.
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SF-100 XTREME
Yes, You Can Have it All, with The SF-100 XTREME
The SF-100 XTREME is the first microlithography system that you simply modify as your needs change. Through advanced optical, mechanical, and electrical design, the system offers unprecedented flexibility, process performance, and upgradeabilty. Need to reduce your feature size? Change the optics! Need to run larger substrates? Upgrade your stage! By advancing your capabilities along a flexible, yet well defined upgrade path, your capital investment is optimized and time lost for new system qualification and process characterization is minimized. The result is that you save both time and money.
When you first purchase an SF-100 XTREME system, you specify your system configuration based upon your current needs. The two major areas that you decide upon are:
• Automated Stage Assembly: For less critical applications, our standard ball screw stage provides high accuracy, exceptional repeatability, and robust performance. More accurate requirements need our linear drive stages, which offer sub micron repeatability, accuracy, and resolution. Since both of these solutions are provided by Aerotech, either choice provides world class precision and performance for substrate movement.
• Imaging Optics Set: Previous SF-100 systems have successfully utilized our standard optics set for producing features with 15 and 5 micron pixels. For smaller features, customers utilize our high resolution optics, which can produce a variety of pixel sizes to support features as small as 1 micron in size.
Even though you need to choose a configuration for your process today, this is not a final decision. Either option for the automated stage assembly and imaging optics set can be changed on a moment’s notice and are field upgrade able. Hence, your SF-100 XTREME can always be configured to support your technology requirements.
Now that you have your SF-100 XTREME system running in your facility, you can always make modifications to your process, as your needs change and new challenges occur:
• Exposure Wavelength: All standard mercury arc lamp energies are available as either broadband or monochromatic exposures. Changing these configurations takes only seconds, as numerous wavelength filters are included with each system.
• Energy Level: Exchange easy access optical components to vary substrate exposure energy levels to accommodate different resist thicknesses, materials, and substrate reflectivities.
• Pixel Size: Through changing reduction lens configurations, pixel sizes can be easily varied for both the standard and high resolution optics. Pixel sizes can range from 15 microns to sub-micron, as dictated by your process requirements.
The time for these changes ranges from a few minutes to less than 2 hours, which allows you to easily and quickly adapt to new technical requirements.
The SF-100 XTREME Can Be Purchased as Either a Stand Alone or Benchtop System
The SF-100 XTREME Includes the Following Standard Features
• Multi Pixel Minimum Features: Using multiple pixels to define a feature ensures process repeatability and feature smoothness, especially for curved and angled features.
• Maskless Processing: Through the elimination of photomasks, all SF-100 systems provide low operational costs, fast turnaround of new designs, and complete design versatility.
• Upgrade to Automated Substrate Handling: All SF-100 XTREME systems can be interfaced with cassette to cassette or cluster tool robotics systems to provide true production level substrate processing.
• Open System Architecture: We utilize an open software platform on the SF-100 XTREME systems and we offer a number of open digital and analog I/O’s as standard with each system. These can be used to interface the system with other technologies to provide turnkey and fully integrated solutions.
• Intelligent Software Solutions: System performance is optimized through the use of our robust and reliable intelligent system software. Features such as skipping areas that aren’t to be exposed, auto focus, level to level alignment, and limiting operator access through administrative passwords are standard on all SF-100 systems.
• No Consumable Costs for 1st Two Years of Operation: We provide all consumables for the first two years of your system operation, irrespective of usage. After this initial period, consumable costs are only for the light source, which are typically less than $1000 US each.
Click here to download the SF-100 XTREME brochure.
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SF-100 XTEND
For the Ultimate in Productivity, You Need the SF-100 XTEND
At Intelligent Micro Patterning, our customers are always looking to do something different and unique. This distinctiveness has driven us to develop our two main optical sets, the standard optics and the high resolution optics. As our customers have embraced these two different technologies, a number of opportunities have arisen where our customers want to run both optics sets at the same time. This desire has led to the development of the SF-100 XTEND.
With the SF-100 XTEND, two optical paths are integrated onto a single platform, allowing you switch between them quickly and easily. The system is ideal for customers who have both large and small features located in a single design and need to optimize their throughput. With the SF-100 XTEND, both sets of optics are always ready, so running these advanced designs is easy and fast. Also, since a single stage is shared between both sets of optics, the user gets significant capabilities at a low system price.
The SF-100 XTEND Provides All of These Features on a Single System:
Two distinct, fully functional optical paths, with each containing:
• Mercury arc lamp light source, providing standard g-, h-, and i-line energies at the substrate.
• Field proven optical design integrated with patented Smart Filter Technology.
• Integrated CCD camera for in-line substrate viewing. Labwindows™ based Vision Developers Module provides the basis
for all camera functions on the system, ensuring reliability and versatility.
• A complete set of optics for patterning fine features down to 1 micron in size. One optical path is designed using our
standard optics, while the other optical path is designed with our high resolution optics.
• Labwindows™ based software integrates all systems functions, while providing an open platform for software
customization and integration with other systems.
Other System Features Include:
• Rapid prototyping of new designs and ideas without the need for costly photomasks saves you time and money.
• Choose the ideal stage that meets the requirements for your specific processing. Piezo electric and linear drive stages are available, with recommendations made based on your individual needs.
• Integrated vibration isolation provides for process repeatability and robustness.
• IMP’s legendary customer service, engineering, and support services ensure your success, including unlimited phone/email support, full customer training both in our factory and at your site, complete factory testing and qualification prior to system shipment, and installation at your site by a qualified IMP field service engineer.
Click here to download the SF-100 XTEND brochure.
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Photonics & Solar PV
