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Bruker acquired the worldwide SPM and OIM instruments business from Veeco. Please cllick here

Metrology & Instrumentation

From the Performance Leader in Measurement Technology

World-leading metrology solutions for scientific research and Industry

From groundbreaking scientific research to high-speed production QC, Bruker provides the critical measurements necessary for success with the world’s broadest range of atomic force microscopes (AFMs), stylus profilers, and non-contact optical solutions. Bruker has extensive application-focused product lines that are specifically engineered to enable the next generation of advances in:-

  • Life Sciences
  • Physical Sciences
  • Materials Research
  • Industrial R&D, QC, and Failure Analysis
  • In-line CD and SWA metrology

Accurate data is the key to innovation, and Bruker has a high-performance solution for every metrology need, at every price range. Let us help you match an enabling measurement technology to your specific application.

Product List:

AFM / SPM   
Bruker’s AFMs bring nanoscale investigation and decades of innovation to every scientific discipline. We have pioneered many of the important advances in AFM technology and platform design, including such techniques as TappingMode™, PhaseImaging™, Torsional Resonance Tunneling AFM, and HarmoniX™ Nanoscale Material Property Mapping, to name just a few. Coupled with our unmatched instrument performance and reliability, as well as our continual investment in the AFM science community through grants, training, and conference sponsorships, it is not surprising that more scientific journal papers credit Bruker AFMs than all other scanning probe systems combined.

 

Automated AFM / AFP 

Bruker provides world’s premier fully automated AFM systems for in-line semiconductor, data storage, MEMS & other industrial applications. The systems provide the highest level of measurement performance for a variety of automated and semi-automated metrology applications, performing Atomic Force Profilometry, Critical Dimension AFM scanning, TappingMode™ for roughness metrology, and deep trench AFM scan modes. With the ability to meet metrology requirements for 45-nanometer and 32-nanometer node processes, the InSight™ 3D Atomic Force Microscope boasts the fastest throughput of any AFM on the market, as well as a 2x improvement over previous AFM.

 

Optical Interferometric Profilers   

Bruker’s Optical Profilers provide an unmatched combination of speed, resolution, and repeatability for surface topography measurements, from sub-nanometer roughness through millimeter-scale steps. With a tradition of nine generations of white light interferometers, Bruker is the world leader in advanced, 3D, non-contact measurement and inspection for research and production. Our profilometry innovations support an enormous variety of applications in solar, semiconductor, magnetic data storage, MEMS, medical implants, and automotive industries, providing customized technology that have fueled advances in everything from consumer electronics to arterial stents.

 

Confocal Microscopes  

Bruker’s VCM™ 3D Confocal Microscopes combine the latest in confocal technology and nanometer-scale height measurements with the ease-of-use of a conventional microscope. With their ability to perform fast, non-invasive 3D sample characterization at submicrometer lateral resolution and nanometer vertical resolution, they provide an ideal solution for analyzing high curvature or steep slopes, as well as measuring beneath transparent media. Confocal metrology provides a powerful, yet approachable technology for applications ranging from micro lens arrays and micro fluidic channels, to high roughness surface process control.

 

Stylus Profilers 

Bruker’s industry-standard Dektak® Stylus Profilers accurately assess film thicknesses, step heights, trench depths, stress and surface roughness properties. With over 40 years of stylus profiling firsts, our systems provide an unmatched combination of low-force stylus technology, unique applications-specific options, and powerful analysis software to enable highly detailed, repeatable characterization of even the most difficult to measure materials and features. Dektak profilers offer accurate, reliable data for research and manufacturing of PV cells, MEMS, semiconductors, flat panel displays, optical thin films, materials and finishes.

 

Atomic Force Microscopes - Systems

Dimension Edge Atomic Force Microscope System - Serious AFM Capabilities for Every Researcher

 

Product Details

  • Best Value Closed-Loop Dimension AFM
  • Accurate, High-Resolution Results Even Faster
  • Solutions for All Applications on Any Sample
  • Advanced Nanoscale Capabilities for Beginners and Experts 

BioScope Catalyst Atomic Force Microscope with ScanAsyst - Accelerating Discovery in Life Science Research

Product Details

 

  • New Standard for Atomic Force Microscopy and Light Microscopy Integration
  • Uncompromised Performance from Both Techniques
  • Easiest to Use and Most Productive Life Science Atomic Force Microscope
  • Simple, Effective Solutions for Biological Samples

Dimension Icon Atomic Force Microscope with ScanAsyst - The Next Dimension in AFM

Product Details

  • Ultimate Performance
  • Immediate Research-Quality Results
  • Easy to Use with Expert Functionality
  • One-Platform - Endless Possiblitiies
  •  

Innova Scanning Probe Microscope - Lowest noise, highest resolution Atomic Force Microscope in its class

Product Details

Features:

  • Exclusive Whisper™ piezo scan technology delivers closed-loop performance with noise-levels approaching highest level open-loop systems
  • Seamless coverage from 90 microns all the way to atomic resolution
  • Wide range of advanced functionality for physical, material & life sciences
  • Now with new modes for materials and device characterization

Benefits:

  • Higher closed-loop performance means routinely obtaining the most accurate data even in the highest resolution applications
  • Higher resolution optics enable faster, more accurate probe positioning and shorter time to better data
  • A full suite of advanced SPM modes provides powerful research flexibility
  • New: Dark Lift for artifact-free characterization of semiconductor devices and photovoltaics

 

 

 

 

 

 

MultiMode Scanning Probe Microscope - World's leading SPM for advanced research imaging

Product Details

MultiMode 8 Scanning Probe Microscope - The World's Highest Resolution, Most Published SPM Just Got Better

  • Highest Performance and Resolution

  • Versatility to Satisfy More Applications

  • Faster and Easier Expert-Quality Results

  • World-Renowned Productivity and Reliability

 

Features:

  • Complete range of AFM techniques for surface characterization of properties
  • Compact hardware design and user-friendly software enables faster, easer data acquisition
  • NanoScope controller provides flexible scanning range from maximum scan down to a few nanometers
  • Heater and cooler accessories and environmental chamber

Benefits:

  • Cited in more scientific publications than all competing systems combined
  • Proven performance in over a thousand installations
  • Multiple scanners let researchers tailor system to meet individual research goals

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Automated AFM / AFP - Systems

InSight 3D Atomic Force Microscope - Production-based 3D reference metrology for 45 nm and below

Product Details

Features:

  • Allows non-destructive, high-resolution 3D measurements of critical 45nm and 32nm semiconductor features
  • Lowest CD and Depth Total Measurement Uncertainty (TMU)
  • Unique, non-destructive, 3D Metrology (LER, LWR, SWA) and inline 3D metrology for Gate
  • Rapid data acquisition:
        30 wph, 9 sites throughput for Depth Metrology
        12 wph, 9 sites throughput for CD Metrology

Benefits:

  • Unparalleled, production-level reliability and automation
  • Speeds development time & helps improve process control
  • Ideal for high-volume production environment
  • Cost-effective way to get products to market faster

 

Dimension Atomic Force Profiler - For chemical mechanical planarization and etch metrology at 65nm

Product Details

Features:

  • Only AFM single-tool fab solution designed for chemical mechanical planarization and etch metrology at 65nm
  • Delivers the fastest throughput of any AFM or profiler
  • Unsurpassed repeatability for in-line STI, W, Cu and CMP metrology

Benefits:

  • Provides the highest performance device characterization and etch depth metrology available
  • Replaces costly, destructive cross-sectioning techniques
  • Reduces measurement turnaround time from days to minutes

 

Dimension Vx200/300 Atomic Force Profiler - Combines AFM resolution with AFP long scan capability

Product Details

Features:

  • Combines superior AFM resolution with Atomic Force Profiler long scan capability
  • Provides non-destructive profiling and high aspect ratio depth measurements in a single platform
  • Delivers unsurpassed quality, resolution, and high-yield throughput
  • Supports multiple applications including wafers, data storage sliders, and square substrates

Benefits:

  • Well suited for CMP control and characterization
  • Useful for 200mm and 300mm substrates
  • Versatile and adaptable -- suits many measurement needs

 

Dimension Vx 210/310 Atomic Force Profiler - CMP metrology combining long scans and AFM resolution

Product Details

Features:

  • For CMP metrology of high vertical and lateral measurements required for sub-0.25 micron features
  • Measures planarity across entire die
  • Enables comparison of pre-and post-CMP effects

Benefits:

  • Provides true AFM resolution imaging
  • Identify defects in features such as tungsten plug recess, vias and metal lines
  • Detects effects such as dishing, erosion, plugs, vias, step heights and planarity

 

Dimension X Automated AFM - Automated AFM cuts etch measurement turnaround time

Product Details

Features:

  • Replaces costly, destructive cross-sectioning techniques
  • Unique Deep Trench (DT) mode operation enables nondestructive in-line measurement of features as small as 45nm
  • Throughput of 25 WPM at 5 sites
  • Fast, highly repeatable characterization and control of STI etch
  • Enables nondestructive measurement directly on production wafers
  • NIST-traceable calibration and proven correlation to SEM techniques

Benefits:

  • Dramatically reduces etch measurement turnaround – from days to minutes – saving time and money
  • Ideal for applications demanding accuracy in high-volume production
  • Highly efficient; reduces steps required for measurement
  • Meets key industry standards
  • Reliable – chosen by fabs worldwide as an AFM they can count on

 

Dimension X3D for Data Storage - 3D metrology for 3D PMR structures and trenches

Product Details

Capabilities:

  • Non-destructive, gauge-capable, automated metrology system for three-dimensional in-line characterization of critical dimensions
  • CMP and surface roughness and defect metrology are enabled due to the low AFM noise floor

Dimension X3D Photomask Atomic Force Microscope - Superior repeatability and high resolution

Product Details

Features:

  • Specially designed for Photomask applications
  • Unique 3D-AFM high-resolution non-destructive technique that is insensitive to material properties
  • Fully automated mask handling for 150mm reticles using a SMIF loadport
  • Designed for the most demanding mask manufacturing processes

Benefits:

  • Provides  superior repeatability, high resolution, and comprehensive profile and CD metrics on a variety of Photomask materials including chrome, quartz, MoSi and photoresist
  • Reliable performance in measuring wide variety of materials
  • Interfaces easily with existing research/production systems
  • Flexibility – gathers detailed information on multiple CD elements using a single AFM tool

Return to Bruker product list 

 

Optical Interferometric Profilers - Systems

ContourGT-K0 Optical Profiler

ContourGT-K0 Optical Profiler

ContourGT-K0 Optical Profiler

Product Details

Affordable, Quantitative, Bench-Top Surface Metrology

The ContourGT-K0 combines exceptional profiling performance, operator convenience, and affordability into one bench-top instrument. The system utilizes white light interferometry to measure surface topography from nanometer-scale roughness through millimeter-scale steps, with sub-nanometer resolution. The system's new Vision64 Operation and Analysis Software features the industry's most functional and streamlined graphical user interface to provide intuitive access to an extensive library of pre-programmed filters and analyses for solar, precision machining, printing, and medical metrology applications. With its combination of advanced interferometric design and ease of use, the ContourGT-K0 is both a perfect entry platform for dedicated non-contact pass-fail measurements and an expert-level tool for developing and testing critical surface texture parameters.

Highest Vertical Resolution over Large Field of View

  • Magnifications from 1.25X to 50X enable characterization of a wide range of surface shapes and textures
  • Sub-angstrom-to-millimeter vertical range at any magnification delivers unparalleled measurement flexibility
  • Enhanced Reliability and Repeatability in Research and Industrial Environments

    • Patented dual-source illumination with high-brightness LEDs provides superior measurement quality

    Accelerated Surface Measurement and Analyses

    • New architecture yields order of magnitude increase in application data processing capacity
    • Parallel processing using multi-core and other techniques provides up to 10X higher throughput on critical metrology analyses

    Best-in-Class Ease of Use and Analysis

    • Streamlined user interface simplifies measurement and data acquisition to increase system and personnel efficiency
    • Unique visual workflow tools provide intuitive access to an extensive library of filters and analysis options
    • Customized reporting distills analysis data for customer-specific requirements

    ContourGT-K1 Optical Profiler

    ContourGT-K1 Optical Profiler

    ContourGT-K1 Optical Profiler

    Product Details

    Bench-Top Surface Metrology for Research and Manufacturing

    The ContourGT-K1 provides the most reliable and repeatable tabletop characterization available for R&D, wear, failure analysis, process control and monitoring. Utilizing white light interferometry, the ContourGT-K1 performs fast, 3D non-contact surface measurements from nanometer-scale roughness through millimeter-scale steps, with sub-nanometer resolution. The system's new Vision64 Operation and Analysis Software features the industry's most functional and streamlined graphical user interface to provide intuitive access to an extensive library of pre-programmed filters and analyses for solar cell, thick films, opthalmics, medical devices, and tribology applications. With its combination of easy measurement setup, fast data acquisition, and stage automation, the ContourGT-K1 delivers top interferometric capabilities and performance with a small footprint suitable for metrology environments from small research labs to manufacturing floors.

    Unmatched Measurement Capabilities with Highest Vertical Resolution over Industry’s Largest Field of View

    • Magnifications from 0.5X to 200X enable characterization of a wide range of surface shapes and textures
    • Sub-angstrom-to-millimeter vertical range at any magnification delivers unparalleled measurement flexibility
    • High-resolution camera option increases lateral resolution

    Unique Metrology Hardware for Enhanced Reliability and Repeatability in Production Environments

    • Patented dual-source illumination with high-brightness LEDs provides superior measurement quality and magnification flexibility

    64-bit, Multi-Core Processor with Vision64 Software for Accelerated Surface Measurement and Analyses

    • New architecture yields order of magnitude increase in application data processing capacity
    • Parallel processing using multi-core optimization and other techniques provides up to 10X higher throughput on critical metrology analyses
    • Unmatched stitching capability seamlessly synthesizes thousands of individual datasets into one contiguous image

    Highly Intuitive User Interface with Best-in-Class Ease of Use, Automation, and Analysis

    • Streamlined user interface simplifies measurement and data acquisition to increase system and personnel efficiency
    • Unique visual workflow tools provide intuitive access to an extensive library of filters and analysis options
    • Customized reporting distills analysis data for customer-specific requirements

     

    ContourGT-X3 Optical Profiler

    ContourGT-X3 Optical Profiler

    ContourGT-X3 Optical Profiler

    Product Details

    High-Performance Production Floor Surface Metrology

    The ContourGT-X3 is a high-performance workhorse for laboratory research and production floor monitoring. The system utilizes Veeco's tenth-generation interferometric sensor technology for rapid, 3D, non-contact surface metrology, and extends capability to large scans (up to 10mm). Motorized XYZ and unique tip/tilt head deliver easy sample setup for operators of any skill level. New Vision64 Operation and Analysis Software provides the industry's most functional and streamlined graphical user interface, combining intelligent architecture with intuitive visual workflow and extensive user-defined automation capabilities for fast and comprehensive data collection and analysis. With its combination of hardware innovation and 64-bit software functionality, the ContourGT-X3 is an indispensable tool for production monitoring and the process development cycle.

     

    Unmatched Measurement Capabilities with Highest Vertical Resolution over Industry’s Largest Field of View

    • Magnifications from 0.5X to 200X enable characterization of a wide range of surface shapes and textures
    • Sub-angstrom-to-millimeter vertical range at any magnification delivers unparalleled measurement flexibility
    • High-resolution camera option increases lateral resolution

    Unique Metrology Hardware for Enhanced Reliability and Repeatability in Production Environments

    • Patented dual-source illumination with high-brightness LEDs provides superior measurement quality and magnification flexibility
    • Optimized hardware design improves vibration, system robustness, and measurement stability

    64-bit, Multi-Core Processor with Vision64 Software for Accelerated Surface Measurement and Analyses

    • New architecture yields order of magnitude increase in application data processing capacity
    • Parallel processing using multi-core optimization and other techniques provides up to 10X higher throughput on critical metrology analyses
    • Unmatched stitching capability seamlessly synthesizes thousands of individual datasets into one contiguous image

    Highly Intuitive User Interface with Best-in-Class Ease of Use, Automation, and Analysis

    • Streamlined user interface simplifies measurement and data acquisition to increase system and personnel efficiency
    • Unique visual workflow tools provide intuitive access to an extensive library of filters and analysis options
    • Customized reporting distills analysis data for customer-specific requirements

     

    ContourGT-X8 Optical Profiler

    ContourGT-X8 Optical Profiler

    ContourGT-X8 Optical Profiler

    Product Details

    Automated, Gauge-Capable Metrology for Process Quality Control

    The ContourGT-X8 provides the highest speed, accuracy, and range for 3D, non-contact surface measurement of ophthalmic lenses, medical devices and tools, high-brightness LEDs, semiconductor devices, through-silicon vias and trenches, solar cells, and precision machined parts. The gauge-capable system offers a stable, robust platform for the production ramp into high-volume manufacturing. A proprietary internal laser reference provides self-calibration to minimize dependence on step standards, and compensates for system drift from environmental or mechanical instability. New Vision64 Operation and Analysis Software provides the industry's most functional and streamlined graphical user interface, combining intelligent architecture with intuitive visual workflow and extensive user-defined automation capabilities for fast and comprehensive data collection and analysis. The ContourGT-X8 is the most advanced optical interferometric profiler available today.

    Unmatched Measurement Capabilities with Highest Vertical Resolution over Industry’s Largest Field of View

    • Magnifications from 0.5X to 200X enable characterization of a wide range of surface shapes and textures
    • Sub-angstrom-to-millimeter vertical range at any magnification delivers unparalleled measurement flexibility
    • High-resolution camera option increases lateral resolution

    Unique Metrology Hardware for Enhanced Reliability and Repeatability in Production Environments

    • Patented dual-source illumination with high-brightness LEDs provides superior measurement quality and magnification flexibility
    • Optimized hardware design improves vibration, system robustness, and measurement stability
    • Patented automatic self-calibration capability ensures tool-to-tool correlation and measurement accuracy and repeatability

    64-bit, Multi-Core Processor with Vision64 Software for Accelerated Surface Measurement and Analyses

    • New architecture yields order of magnitude increase in application data processing capacity
    • Parallel processing using multi-core optimization and other techniques provides up to 10X higher throughput on critical metrology analyses
    • Unmatched stitching capability seamlessly synthesizes thousands of individual datasets into one contiguous image

    Highly Intuitive User Interface with Best-in-Class Ease of Use, Automation, and Analysis

    • Streamlined user interface simplifies measurement and data acquisition to increase system and personnel efficiency
    • Unique visual workflow tools provide intuitive access to an extensive library of filters and analysis options
    • Customized reporting distills analysis data for customer-specific requirements

     

NPFLEX 3D Metrology System

NPFLEX 3D Metrology System

NPFLEX 3D Metrology System

Product Details

Delivering New Perspective to Precision Manufacturing

The NPFLEX 3D Metrology System from Bruker provides the most flexible, non-contact 3D area surface characterization available on the market for large samples, such as orthopedic medical implants and large and unusual parts routinely seen in aerospace, automotive and precision machining industries.

Based on white-light interferometry, the NPFLEX provides data density, resolution, and repeatability beyond what is possible with contact instrumentation, making it ideal as both a complementary technology or as a stand-alone metrology solution. A breakthrough open-gantry design affords over 300 degrees of access to surfaces previously too difficult to analyze due to size or part orientation. The NPFLEX enables superior flexibility, accuracy, and throughput for precision manufacturing, providing an easy path to tighter tolerances, more efficient processes, and better end products.

  • Characterize Large Shapes and Critical Angles
  • Collect High-Density, 3D Area Information
  • Measure with Nanometer Resolution
  • Perform Rapid Data Acquisition

Measurement Flexibility to Characterize Large Shapes and Critical Angles

  • Innovative design accommodates samples of widely varied size and shape
  • Handles samples up to 13-inches tall, and up to 200 pounds in weight
  • Open gantry, custom fixturing, and optional swivel head reveals previously inaccessible areas of interest

Definitive Results from High-Density, 3D Areal Information

  • Each measurement contains complete surface information for multi-variable analyses
  • More data leads to better decisions

Revealed Detail at Nanometer Resolution

  • Interferometry provides sub-nanometer vertical resolution at every pixel
  • Industry-proven technology ensures statistical certainty to achieve tighter tolerances

Throughput and Efficiency Gains through Rapid Data Acquisition

  • Minimal sample preparation and measurement setup reduces time to result
  • Large field of view characterizes more information about surfaces than contact measurement techniques

 

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Bruker 3D Confocal Microscopes for Metrology

What Is Confocal Imaging?
 

Confocal imaging originally was developed as an alternative to wide-field fluorescence microscopes, which bathed samples in light and recorded all the resulting fluorescence. Confocal microscopes utilize point illumination and block all but a pinhole of light back to the detector, eliminating out-of-focus data. This architecture gives confocal microscopy excellent resolution in the Z direction by excluding light from features above or below the object plane within the sample.

However, since this small aperture excludes light from all other points in the object plane, confocal systems need to scan back and forth to acquire a full image. This thin planar focus technique of imaging essentially allows confocal microscopes to optically section a sample, making them particularly good at providing non-contact, high-resolution 3D information about a sample.

Bruker Confocal Metrology (VCM™) 3D Microscopes

Types Of Confocal Microscopes

There are several general classes of confocal microscopes available on the market today, the most common of which are confocal laser scanning microscopes and spinning disc confocal microscopes. Each has particular advantages and limitations, with the biggest tradeoff being either optimized resolution or sensitivity for rapid image capture.

  • Confocal Laser Scanning Microscopes utilize focused laser beams to scan samples’ surfaces point-by-point, electronically building a comprehensive three-dimensional image of the object in much the same way as is done with scanning electron microscopes. This method allows very precise control of excitation both by the control over laser beam and with the type of laser used. Primarily used in life sciences applications, this type of confocal technology provides both high image quality and greater flexibility for fluorescent studies
  • Spinning Disc Confocal Microscopes utilize a disc with many pinholes arranged in a spiral to produce the focused image of the sample. Thus, such systems can collect data simultaneously from multiple points within the object plane as the disc is rapidly spun. A linear path is traced through the image, and a detector acquires data from each aperture to build a high-resolution 3D model composed of hundreds of these slices in mere seconds. Spinning disc confocal microscopes can achieve very fast image recording rates

Choose The Right Confocal Metrology Solution

Every application has different measurement requirements, different datasets to be examined to assess material properties and performance. The Bruker VCM Microscope is a white-light spinning disc confocal microscope that lets users vertically adjust the focal plane of the detector while providing wavelength flexibility allowing quantitative analysis of a wide material set including imaging through layers of transmissive media, such as environmental chamber windows, MEMS packaging, or even different layers of films, without damaging the sample or deconstructing the sample covering.

The VCM technology provides comprehensive metrology solutions for research and industrial applications that require fast, accurate, three-dimensional visualization and submicron resolution and precision, such as:

  • Investigating the aspheric elements of microlens structures built via lithographic techniques or via injection molding
  • Confirming internal and external profiles of fully manufactured microfluidics structures
  • Profiling steady-state fluid surfaces in open microchannels

Whether using confocal microscopy, or Bruker’s other 3D optical solutions, Bruker has decades of experience in enhancing the strengths and effective application of these surface metrology technologies. Through collaboration with thousands of customers, we have advanced expertise in determining which surface metrology solution offers the researcher the right tool for a particular application or sample.

Supporting Your Research

As we have done with thousands of researchers in every field, Bruker is ready to help you pick the right tool to advance your research. You can:

  • Contact us today to discuss your specific application requirements
  • Arrange to send us samples, so we can run tests and see which of our industry-leading metrology solutions will work best for you

See Our Bruker Confocal 3D Microscopes

Spinning Disc Confocal Technology for Fast Scanning

 Return to Bruker product list 


Stylus Profilers - Dektak Systems

Dektak 150+ Surface Profiler - High performance repeatability, versatility and value in a single system

Product Details

Features:

  • Large standard Z range of 1 millimeter enables larger step measurements
  • Optional X-Y and Y automated stage delivers programmability of over 200 locations
  • Cast aluminum frame and rigid support elements
  • Easy measurement setup
  • 200 mm wafer support

Benefits:

  • Cost-effective, complete solution for numerous research and industry applications
  • Economical 3D mapping capability
  • Industry-leading sample flexibility
  • Industry-best 4-angstrom repeatability
  • Industry’s lowest noise floor

 

Dektak 8 Surface Profiler

Product Details

Features:

  • Combines high repeatability, low-force sensor technology, and advanced 3D data analysis
  • 7.5 angstrom, 1 sigma step height repeatability and a vertical range of up to 1mm
  • Overhead gantry design enables scan lengths to 200mm
  • N•Lite™ low force sensor option offers stylus forces down to 0.03mg
  • High aspect ratio tips ideal for measuring Shallow Trench Isolation (STI) etch depth and deep structures

Benefits:

  • Ideal for surface characterization of MEMS, semiconductors and other thin/thick films
  • Well suited to planarity and flatness measurements
  • Scratch-free measurement of soft materials
  • Allows use of super-sharp styli to characterize sub-micron lines and spaces

 

DektakXT - Stylus Surface Profiling System - The New Standard in Stylus Profilometry

Product details
The Bruker DektakXT™ stylus profiler features a revolutionary design that enables unmatched repeatability of under five angstroms (<5Å) and up to 40% improved scanning speeds. This major milestone in stylus profiler performance is the culmination of Dektak's forty-year legacy of innovation and industry leadership. Through a powerful combination of industry firsts including a unique single-arch design and smart electronics for unmatched repeatability and performance, HD true color camera for enhanced image resolution and clarity, and a 64-bit parallel processing software architecture for accelerated analysis and best-in-class ease-of-use, DektakXT delivers ultimate performance and efficiency to accelerate advances in materials research and product quality. The remarkable breakthroughs incorporated in this tenth-generation Dektak® system enable the critical nanometer-level film, step and surface measurements that will power future advances in the microelectronics, semiconductor, solar, high-brightness LED, medical, scientific and materials science markets.

Click to see full image of the DektakXT Stylus Surface Profiling System

DektakXT

Stylus Surface Profiling System

 

Click to see close-up image of the DektakXT Stylus Surface Profiling System

DektakXT 

Stylus Profiler Close-Up

 

DektakXT delivers:

Unmatched performance and better than 5Å repeatability

  • Single-arch design provides breakthrough platform stability
  • Leading-edge "smart electronics" establish new low-noise benchmark
  • New hardware configuration offers 40% shorter collection times than prior generations

Unprecedented efficiency and ease of use

  • Intuitive Vision64™ user interface workflow simplifies operation
  • Single sensor design enables the widest range of capabilities in a single platform
  • Self-aligning styli enables effortless tip exchange

Incomparable value from the world leader in stylus profilers

  • Bruker delivers premier performance in an affordable package
  • Full complement of accessories extend versatility and tailor system to your application

 

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